High Resolution Sputter Coater Cressington 208HRD

Description

The 208HRD High Resolution Sputter Coater from Cressington offers real solutions to the problems encountered when coating difficult samples for FESEM imaging. FESEM applications need extremely thin, fine-grained, uniform coatings to eliminate charging and to improve contrast on low density materials. In order to minimize the effects of grain size, the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. The 208HRD Turbo Pumped High Vacuum System offers a wide range of operating pressures allowing precise control of both uniformity and conformity of the coating, minimizing charging effects.

The 208HRD High Resolution Sputter Coater is a complete coating solution, including as standard:

• Pumping system with turbo pump, backing pump for turbo, and vacuum connections
• MTM-20 High Resolution Film Thickness Controller
• Rotary-Planetary-Tilting Stage with sample holder selection (4)
• Target selection such as Ir, Pt/Pd, or Cr. See here for full list of targets. 

Main Features:

Wide choice of Coating Materials. Magnetron head design and effective gas handling allow a wide choice of target materials .

Economical target utilization. The 208HRD offers a smaller diameter target and modified chamber configurations to give more economical usage for costly materials like iridium.

Precision Thickness Control. Thickness optimized for FESEM application using the MTM-20 High Resolution Thickness Controller, which has a resolution of 0.1nm. This enables precise and reproducible thin coatings, especially in the range of 0.5 - 3nm, a thickness desirable for FESEM applications.

Multi-angle Stage Movements. Separate rotary, planetary and tilting stage movements ensure uniform coating with excellent conformity, even on highly topographic samples. Four sample holders are provided with options to accommodate sample sizes as large as 40mm diameter.

Variable Chamber Geometry. Chamber geometry is used to adjust deposition rate to optimize structure. Height can be adjusted by the addition of metal spacer rings (2 included).

Compact, Modern, Benchtop Design. Space and energy saving design eliminates need for floor space, water or specialized electrical connections. Integrated turbo pump ensures fast pump down combined with high positive pumping speed during sputtering process. Integrated turbo pump ensures fast pump down speed. The backing pump for the turbo is a diaphragm pump, giving oil free operation.